Title :
Registration mark detection for scanning ion beam lithography
Author :
Evason, A.F. ; Cleaver, J.R.A. ; Heard, P.J. ; Ahmed, Hameeza
Author_Institution :
Cambridge University, Microelectronics Research Laboratory, Cambridge, UK
Abstract :
The application of scanning ion beam lithography techniques to microelectronic device fabrication requires an ability to register the ion beam to features on the device. Imaging procedures have been investigated, and registration marks have been imaged with good contrast and resolution.
Keywords :
integrated circuit technology; ion beam lithography; semiconductor technology; IC; microelectronic device fabrication; registration mark detection; scanning ion beam lithography; semiconductor technology;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19850445
