• DocumentCode
    1003656
  • Title

    Registration mark detection for scanning ion beam lithography

  • Author

    Evason, A.F. ; Cleaver, J.R.A. ; Heard, P.J. ; Ahmed, Hameeza

  • Author_Institution
    Cambridge University, Microelectronics Research Laboratory, Cambridge, UK
  • Volume
    21
  • Issue
    14
  • fYear
    1985
  • Firstpage
    629
  • Lastpage
    630
  • Abstract
    The application of scanning ion beam lithography techniques to microelectronic device fabrication requires an ability to register the ion beam to features on the device. Imaging procedures have been investigated, and registration marks have been imaged with good contrast and resolution.
  • Keywords
    integrated circuit technology; ion beam lithography; semiconductor technology; IC; microelectronic device fabrication; registration mark detection; scanning ion beam lithography; semiconductor technology;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19850445
  • Filename
    4250634
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1003656