Title : 
Strained p-channel InGaSb/AlGaSb modulation-doped field-effect transistors
         
        
            Author : 
Lott, James A. ; Klem, John F. ; Wendt, J.R.
         
        
            Author_Institution : 
Sandia Nat. Labs., Albuquerque, NM, USA
         
        
        
        
        
            fDate : 
7/16/1992 12:00:00 AM
         
        
        
        
            Abstract : 
Strained In0.25Ga0.75Sb p-channel modulation-doped field-effect transistors with Al0.75Ga0.25Sb Be-doped barrier layers are demonstrated. The extrinsic normalised transconductances for 1.2 mu m gate length devices range from 33 to 51 mS/mm at 300 K and from 132 to 161 mS/mm at 77 K. At 300 K, the devices operated in depletion mode with a threshold voltage of approximately 0.3 V, a normalised output conductance of less than 3mS/mm, and maximum drain current densities of approximately 20mA/mm. The devices show promise for complementary heterojunction field-effect transistor logic applications.
         
        
            Keywords : 
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium antimonide; 1.2 micron; 3 mS; 33 to 161 mS; 77 to 300 K; Be-doped barrier layers; In 0.25Ga 0.75Sb-Al 0.75Ga 0.25Sb:Be; MODFET; complementary heterojunction; depletion mode; extrinsic normalised transconductances; field-effect transistors; logic applications; modulation-doped; strained p-channel; threshold voltage;
         
        
        
            Journal_Title : 
Electronics Letters
         
        
        
        
        
            DOI : 
10.1049/el:19920928