• DocumentCode
    1003931
  • Title

    Ion beam mixing of some amorphous magnetic films

  • Author

    Suran, G. ; Krishnan, R. ; Tessier, M. ; Gerard, P.

  • Author_Institution
    CNRS, Bellevue-Meudon, France
  • Volume
    20
  • Issue
    5
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    1423
  • Lastpage
    1428
  • Abstract
    Ion beam mixing is investigated as an alternate preparation technique for obtaining an amorphous magnetic thin films. We studied the structural and magnetic properties of (Fe20Ni80)1-xSix, CO1-xNbxand GdxFe1-xthin films. The samples were prepared by depositing the two constituants sequentially under ultra high vacuum and were irradiated by Xe ions at an energy of 200 to 400 keV and doses of 3 to 6×1015ion/cm2. Composition and structural properties were determined by R.B.S., RHEED, TEM and SIMS. F.M.R. measurements showed that in accordance with structural investigations only a 500 Å thick surface layer is mixed at 200 keV, but for 400 keV one obtains a magnetically uniform sample. Increasing the dose permits to improve the short range chemical order. Low temperature measurements confirmed the good quality of the samples mixed at 400 keV, where Msfollows a Blochs law as a function of temperature. The variations of the coercive field, the induced anisotropy as a function of mixing parameters and for the various alloys is also reported. In Gd-Fe samples the mixing is far from complete showing that the efficiency of the mixing depends upon the nature of the alloy.
  • Keywords
    Amorphous magnetic films/devices; Ion implantation; Amorphous magnetic materials; Amorphous materials; Elementary particle vacuum; Ion beams; Iron; Magnetic films; Magnetic properties; Niobium; Semiconductor thin films; Thickness measurement;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1984.1063275
  • Filename
    1063275