DocumentCode :
1004524
Title :
Reactive ion etching of beta-SiC in CCL
2
F
2
O
2
Author :
Kuzmik, J. ; Michelakis, C. ; Konstantinidis, G. ; Papanicolaou, N.C.
Volume :
29
Issue :
1
fYear :
1993
fDate :
1/7/1993 12:00:00 AM
Firstpage :
18
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19930012
Filename :
256156
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1004524
