DocumentCode :
1006468
Title :
Effects of channel shapes on MOSFET hot-electron resistance
Author :
Huang, Tiao-Yuan
Author_Institution :
Xerox Palo Alto Research Center, Palo Alto, USA
Volume :
21
Issue :
5
fYear :
1985
Firstpage :
211
Lastpage :
212
Abstract :
Transistors with funnel-shaped channel regions are studied in terms of hot-electron effects. Experimental results indicate that funnel-shaped transistors are more resistant to hot-electron effects when operating with the wider-channel region close to the drain. It is suggested that future transistor design could take advantage of this effect in obtaining optimum hot-electron-resistant transistors.
Keywords :
hot carriers; insulated gate field effect transistors; MOSFET; channel shapes; funnel-shaped channel regions; hot-electron resistance; transistor design; wider-channel region;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850148
Filename :
4250968
Link To Document :
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