DocumentCode :
1007183
Title :
Surface electrical breakdown and leakage current on semi-insulating InP
Author :
Kitagawa, Tomotaka ; Hasegawa, Hiroshi ; Ohno, Hideo
Author_Institution :
Hokkaido University, Department of Electrical Engineering, Faculty of Engineering, Sapporo, Japan
Volume :
21
Issue :
7
fYear :
1985
Firstpage :
299
Lastpage :
301
Abstract :
Surface electrical breakdown on a semi-insulating InP substrate is investigated. The surface is bare or passivated with anodic oxide, SiO2 or Si3N4 The observed breakdown voltage is about one order of magnitude higher than that of semi-insulating GaAs. The leakage current is sensitive to passivation processes and a thin anodic oxide gives the lowest leakage.
Keywords :
III-V semiconductors; electric breakdown of solids; indium compounds; leakage currents; passivation; III-V semiconductor; InP; Si3N4; SiO2; anodic oxide; breakdown voltage; leakage current; passivation; semiinsulating substrate; surface electrical breakdown;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850214
Filename :
4251036
Link To Document :
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