DocumentCode :
1007701
Title :
Improvement of GaN-based light-emitting diode by indium-tin-oxide transparent electrode and vertical electrode
Author :
Kim, Seong-Jin
Author_Institution :
Photonic Devices Res. Lab., Itswell Co., Chungbuk, South Korea
Volume :
17
Issue :
8
fYear :
2005
Firstpage :
1617
Lastpage :
1619
Abstract :
A sapphire-etched vertical-electrode nitride semiconductor (SEVENS) light-emitting diode (LED) is fabricated by means of a selective chemical wet-etching technique. The SEVENS-LED formed on sapphire substrate exhibits excellent device performance compared to a conventional NiAu lateral-electrode (LE) GaN-based LED formed on the same sapphire substrate. The integral light-output power of SEVENS-LED is ∼7 mW, which is 1.75 times stronger than that of the conventional NiAu LE-LED (∼4 mW). The external quantum efficiency of SEVENS-LED is estimated to be approximately 13%.
Keywords :
III-V semiconductors; electrodes; etching; gallium compounds; indium compounds; light emitting diodes; wide band gap semiconductors; 7 mW; Al2O3; GaN; GaN-based LED; ITO; InSnO; chemical wet-etching; external quantum efficiency; indium-tin-oxide electrode; integral light-output power; light-emitting diode; nitride semiconductor LED; sapphire substrate; sapphire-etched LED; transparent electrode; vertical electrode; Chemicals; Electrodes; Light emitting diodes; Liquid crystal displays; Radio frequency; Scanning electron microscopy; Semiconductor lasers; Substrates; Thermal conductivity; Wet etching; GaN; III–V light-emitting diode (LED); indium-tin-oxide (ITO); metal–organic chemical vapor deposition;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2005.851982
Filename :
1471753
Link To Document :
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