DocumentCode :
1007787
Title :
New phase formation and superconductivity in reactively diffused Nb3Sn multilayer films
Author :
Vandenberg, J.M. ; Gurvitch, M. ; Hamm, R.A. ; Hong, M. ; Rowell, J.M.
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ
Volume :
21
Issue :
2
fYear :
1985
fDate :
3/1/1985 12:00:00 AM
Firstpage :
819
Lastpage :
822
Abstract :
Thin films of A15 Nb3Sn have been prepared by reactive diffusion of sputter-deposited Nb/Sn multilayers. The layer thicknesses were arranged in such a way as to produce Nb3Sn and desired off-stoichiometry samples. The reaction was studied by means of in situ temperature-dependent X-ray analysis in the range 50°C-950°C. It was observed that, prior to the formation of the Al5 phase, a very rapid reaction takes place between the Nb sublayers and molten Sn. In this reaction a new phase was observed which could be interpreted as a hexagonal Laves phase NbSn2. This phase transforms into orthorhombic NbSn2which then reacts with the remaining Nb to form Al5 Nb3Sn. The fact that the reaction occurs at the Nb/liquid Sn interface with the formation of the most Sn-rich phase indicates that the reaction takes place by diffusion of Nb into liquid Sn. The highest superconducting transition temperature was found to be 17.45°K. The values of the Al5 cell parameters indicated that the diffusion reaction of both on-and off - stoichiometry Nb3Sn multilayers is driven towards the Sn-rich side of Nb3Sn, with a maximum composition range of 24-28 at% Sn.
Keywords :
Superconducting materials; Niobium; Niobium-tin; Nonhomogeneous media; Sputtering; Substrates; Superconducting films; Superconducting thin films; Superconducting transition temperature; Superconductivity; Tin;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1985.1063612
Filename :
1063612
Link To Document :
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