DocumentCode
1007787
Title
New phase formation and superconductivity in reactively diffused Nb3 Sn multilayer films
Author
Vandenberg, J.M. ; Gurvitch, M. ; Hamm, R.A. ; Hong, M. ; Rowell, J.M.
Author_Institution
AT&T Bell Laboratories, Murray Hill, NJ
Volume
21
Issue
2
fYear
1985
fDate
3/1/1985 12:00:00 AM
Firstpage
819
Lastpage
822
Abstract
Thin films of A15 Nb3 Sn have been prepared by reactive diffusion of sputter-deposited Nb/Sn multilayers. The layer thicknesses were arranged in such a way as to produce Nb3 Sn and desired off-stoichiometry samples. The reaction was studied by means of in situ temperature-dependent X-ray analysis in the range 50°C-950°C. It was observed that, prior to the formation of the Al5 phase, a very rapid reaction takes place between the Nb sublayers and molten Sn. In this reaction a new phase was observed which could be interpreted as a hexagonal Laves phase NbSn2 . This phase transforms into orthorhombic NbSn2 which then reacts with the remaining Nb to form Al5 Nb3 Sn. The fact that the reaction occurs at the Nb/liquid Sn interface with the formation of the most Sn-rich phase indicates that the reaction takes place by diffusion of Nb into liquid Sn. The highest superconducting transition temperature was found to be 17.45°K. The values of the Al5 cell parameters indicated that the diffusion reaction of both on-and off - stoichiometry Nb3 Sn multilayers is driven towards the Sn-rich side of Nb3 Sn, with a maximum composition range of 24-28 at% Sn.
Keywords
Superconducting materials; Niobium; Niobium-tin; Nonhomogeneous media; Sputtering; Substrates; Superconducting films; Superconducting thin films; Superconducting transition temperature; Superconductivity; Tin;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1985.1063612
Filename
1063612
Link To Document