DocumentCode :
1007818
Title :
Josephson tunnel junctions with refractory electrodes
Author :
Raider, S.I.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, New York
Volume :
21
Issue :
2
fYear :
1985
fDate :
3/1/1985 12:00:00 AM
Firstpage :
110
Lastpage :
117
Abstract :
Fabrication of high quality Josephson tunnel junctions with refractory electrodes is made difficult by the electrode´s short coherence lengths and the sensitivity of the their superconducting properties to tunnel barrier processing. Several innovative procedures have been developed to address this problem. In this review, we describe these tunnel barrier processes and the junction characteristics that were obtained using them. In particular, attention is focused on the junction´s subgap conductance and the reproducibility of the maximum Josephson current because of their importance as device design parameters for integrated circuits.
Keywords :
Bibliographies; Josephson devices; Capacitance; Chemicals; Electrical resistance measurement; Electrodes; Energy measurement; Fabrication; Josephson effect; Niobium; Reproducibility of results; Thin film circuits;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1985.1063615
Filename :
1063615
Link To Document :
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