Title :
A Physics-Based Modeling of Interelectrode MOS Capacitances of Power MOSFET and IGBT
Author :
Rael, S. ; Davat, Bernard
Author_Institution :
Inst. Nat. Polytech. de Lorraine, Nancy Univ., Vandoeuvre-les-Nancy
Abstract :
The conventional and widespread modeling of interelectrode capacitances of power MOSFET and insulated gate bipolar transistor is based on a single dipolar representation of the electric charge induced in the intercellular drain region. In this paper, it is proved by some experimental tests that this representation, symbolized by the gate transfer capacitance C GD, may not be physics-based, especially under negative gate polarization. Then, it is demonstrated that interelectrode MOS capacitances are fundamentally of three-port coupling origin. A physical capacitive model, available for both gate capacitance and gate transfer capacitance, is detailed, implemented in a simulation software, and compared with experiment.three-port coupling origin.
Keywords :
insulated gate bipolar transistors; power MOSFET; semiconductor device models; IGBT; gate transfer capacitance; insulated gate bipolar transistor; intercellular drain region; interelectrode MOS capacitances; negative gate polarization; power MOSFET; Bipolar transistors; Capacitance; Insulated gate bipolar transistors; Insulation; MOSFET circuits; Polarization; Power MOSFET; Power electronics; Testing; Voltage; Insulated gate bipolar transistor (IGBT); MOS capacitance; MOSFET; physical modeling; power electronics; semiconductor devices;
Journal_Title :
Power Electronics, IEEE Transactions on
DOI :
10.1109/TPEL.2008.2002092