• DocumentCode
    1010738
  • Title

    Reduction of geometric taper losses in the PCVD process

  • Author

    Geittner, P. ; Hagemann, H.J. ; Warnier, J. ; Weling, F. ; Wilson, H.

  • Author_Institution
    Philips GmbH, Forschungslaboratorium Aachen, Aachen, West Germany
  • Volume
    21
  • Issue
    19
  • fYear
    1985
  • Firstpage
    870
  • Lastpage
    871
  • Abstract
    Using a simple model for the PCVD process, we have calculated deposition profiles for different experimental conditions. Theory and experiment show that geometric taper lengths increase with the total gas flow and that they can be reduced by a factor of five by using optimised velocity ramps for the moving plasma zone.
  • Keywords
    chemical vapour deposition; plasma deposition; PCVD process; deposition profiles; geometric taper losses; moving plasma zone; optimized velocity ramps; total gas flow;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19850614
  • Filename
    4251416
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1010738