Title :
Reduction of geometric taper losses in the PCVD process
Author :
Geittner, P. ; Hagemann, H.J. ; Warnier, J. ; Weling, F. ; Wilson, H.
Author_Institution :
Philips GmbH, Forschungslaboratorium Aachen, Aachen, West Germany
Abstract :
Using a simple model for the PCVD process, we have calculated deposition profiles for different experimental conditions. Theory and experiment show that geometric taper lengths increase with the total gas flow and that they can be reduced by a factor of five by using optimised velocity ramps for the moving plasma zone.
Keywords :
chemical vapour deposition; plasma deposition; PCVD process; deposition profiles; geometric taper losses; moving plasma zone; optimized velocity ramps; total gas flow;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19850614
