Title :
Structure and morphology of RF sputtered carbon overlayer films
Author_Institution :
Memorex Corporation, Santa Clara, California.
fDate :
9/1/1985 12:00:00 AM
Abstract :
The morphology and structure of RF sputtered carbon films have been investigated. The growth of these films is shown to take place by the formation and agglomeration of rounded particles. The film growth mechanism and the substrate nature were the primary factors determining the morphology of carbon films. The structure of the carbon films was found to be predominantly amorphous.
Keywords :
Chromium; Diamond-like carbon; Electrons; Magnetic films; Optical films; Radio frequency; Sputtering; Surface cracks; Surface morphology; Surface topography;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1985.1063948