Title :
The dependence of magnetostriction of sputtered Co-Cr thin films on crystal structure
Author :
Niimura, Yoshiro ; Naoe, Masahiko ; Niimura, Y. ; Naoe, Masayuki
Author_Institution :
Tokyo Institute of Technology, Meguro-Ku, Tokyo, Japan
fDate :
9/1/1985 12:00:00 AM
Abstract :
The saturation magnetostriction λ of the sputtered Co-Cr films deposited on the glass substrate by means of a Targets Facing Type of Sputtering (TFTS) system was evaluated with varying Cr content, substrate temperature and argon gas pressure. X-ray diffraction analysis (XRD) was unable to distinguish α-phase crystallites of fcc structure from ε-phase crystallites of hcp structure in all the film specimens prepared for evaluating λ, since the
Keywords :
Magnetic film memories; Magnetostrictive materials/devices; Argon; Chromium; Crystallization; Glass; Magnetic analysis; Magnetostriction; Sputtering; Substrates; Temperature; X-ray diffraction;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1985.1063955
