• DocumentCode
    1012233
  • Title

    New insulated-gate inverted structure AlGaAs/GaAs/n-AlGaAs HEMT ring oscillator

  • Author

    Kinoshita, Hiroyuki ; Ishida, Tomoyuki ; Akiyama, Masanori ; Inomata, Hisao ; Sano, Yousuke ; Nishi, Shohei ; Kaminishi, K.

  • Author_Institution
    Oki Electric Industry Co. Ltd., Research Laboratory, Hachioji, Japan
  • Volume
    21
  • Issue
    23
  • fYear
    1985
  • Firstpage
    1062
  • Lastpage
    1064
  • Abstract
    Inverted-structure high electron mobility transistors with insulated-gate structure, i.e. AlGaAs/GaAs/n-AlGaAs, have been successfully applied to E/D-type DCFL ring oscillators. High transconductance of 280 mS/mm was obtained at 77 K in an enhancement-mode FET with 0.8 ¿m gate length. Gate leakage current was small enough even at a gate voltage of +1.4 V both at 300 K and 77 K, and a high logic swing of more than 1 V was achieved using a DCFL inverter. A 21-stage ring oscillator showed a minimum gate delay as small as 18.0 ps with power dissipation of 520 ¿W/gate at 77 K.
  • Keywords
    III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; AlGaAs; DCFL inverter; E/D/type DCFL ring oscillators; GaAs; HEMT ring oscillator; III-V semiconductors; enhancement-mode FET; high electron mobility transistors; insulated-gate inverted structure; minimum gate delay; power dissipation; transconductance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19850753
  • Filename
    4251590