DocumentCode :
1012233
Title :
New insulated-gate inverted structure AlGaAs/GaAs/n-AlGaAs HEMT ring oscillator
Author :
Kinoshita, Hiroyuki ; Ishida, Tomoyuki ; Akiyama, Masanori ; Inomata, Hisao ; Sano, Yousuke ; Nishi, Shohei ; Kaminishi, K.
Author_Institution :
Oki Electric Industry Co. Ltd., Research Laboratory, Hachioji, Japan
Volume :
21
Issue :
23
fYear :
1985
Firstpage :
1062
Lastpage :
1064
Abstract :
Inverted-structure high electron mobility transistors with insulated-gate structure, i.e. AlGaAs/GaAs/n-AlGaAs, have been successfully applied to E/D-type DCFL ring oscillators. High transconductance of 280 mS/mm was obtained at 77 K in an enhancement-mode FET with 0.8 ¿m gate length. Gate leakage current was small enough even at a gate voltage of +1.4 V both at 300 K and 77 K, and a high logic swing of more than 1 V was achieved using a DCFL inverter. A 21-stage ring oscillator showed a minimum gate delay as small as 18.0 ps with power dissipation of 520 ¿W/gate at 77 K.
Keywords :
III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; AlGaAs; DCFL inverter; E/D/type DCFL ring oscillators; GaAs; HEMT ring oscillator; III-V semiconductors; enhancement-mode FET; high electron mobility transistors; insulated-gate inverted structure; minimum gate delay; power dissipation; transconductance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850753
Filename :
4251590
Link To Document :
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