DocumentCode
1012233
Title
New insulated-gate inverted structure AlGaAs/GaAs/n-AlGaAs HEMT ring oscillator
Author
Kinoshita, Hiroyuki ; Ishida, Tomoyuki ; Akiyama, Masanori ; Inomata, Hisao ; Sano, Yousuke ; Nishi, Shohei ; Kaminishi, K.
Author_Institution
Oki Electric Industry Co. Ltd., Research Laboratory, Hachioji, Japan
Volume
21
Issue
23
fYear
1985
Firstpage
1062
Lastpage
1064
Abstract
Inverted-structure high electron mobility transistors with insulated-gate structure, i.e. AlGaAs/GaAs/n-AlGaAs, have been successfully applied to E/D-type DCFL ring oscillators. High transconductance of 280 mS/mm was obtained at 77 K in an enhancement-mode FET with 0.8 ¿m gate length. Gate leakage current was small enough even at a gate voltage of +1.4 V both at 300 K and 77 K, and a high logic swing of more than 1 V was achieved using a DCFL inverter. A 21-stage ring oscillator showed a minimum gate delay as small as 18.0 ps with power dissipation of 520 ¿W/gate at 77 K.
Keywords
III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; AlGaAs; DCFL inverter; E/D/type DCFL ring oscillators; GaAs; HEMT ring oscillator; III-V semiconductors; enhancement-mode FET; high electron mobility transistors; insulated-gate inverted structure; minimum gate delay; power dissipation; transconductance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19850753
Filename
4251590
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