• DocumentCode
    1012251
  • Title

    InAs/AlSb double-barrier structure with large peak-to-valley current ratio: a candidate for high-frequency microwave devices

  • Author

    Söderström, J.R. ; Chow, D.H. ; McGill, T.C.

  • Author_Institution
    Lab. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
  • Volume
    11
  • Issue
    1
  • fYear
    1990
  • Firstpage
    27
  • Lastpage
    29
  • Abstract
    Negative differential resistance (NDR) in InAs/AlSb/InAs/AlSb/InAs double-barrier structures with peak-to-valley current (PVC) ratios as large as 11 at room temperature and 28 at 77 K is reported. This is a large improvement over previous results for these materials and is also considerably better than those obtained for the extensively studied GaAs/AlGaAs material system. The peak current density was also improved by reducing the barrier thickness, and values exceeding 10/sup 5/ A/cm/sup 2/ have been observed. These results suggest that InAs/AlSb structures are interesting alternatives to conventional GaAs/AlGaAs structures in high-frequency devices. NDR in a InAs/AlSb superlattice double-barrier structure with a lower PVC ratio than in the solid barrier case has also been observed. This result indicates that valley current contributions arising from X-point tunneling are negligible in these structures, consistent with the large band offset.<>
  • Keywords
    III-V semiconductors; aluminium compounds; indium compounds; negative resistance; semiconductor superlattices; solid-state microwave devices; 77 K; InAs-AlSb-InAs-AlSb-InAs double barrier structure; PVC ratio; X-point tunneling; band offset; barrier thickness; current density; high-frequency microwave devices; negative differential resistance; peak-to-valley current ratio; room temperature; solid barrier; superlattice double-barrier structure; valley current contributions; Current density; Gallium arsenide; Intrusion detection; Laboratories; Microwave devices; Physics; Semiconductor superlattices; Strontium; Temperature; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.46920
  • Filename
    46920