• DocumentCode
    1012317
  • Title

    Domain formation characteristics during thermomagnetic recording for amorphous TbFe and TbFeCo alloy thin films

  • Author

    Lee, Seh Kwang ; Kim, Soon Gwang

  • Author_Institution
    Div. of Mater. Sci. & Eng., Korea Adv. Inst. of Sci. & Technol., Cheongyrang, Seoul, South Korea
  • Volume
    25
  • Issue
    5
  • fYear
    1989
  • fDate
    9/1/1989 12:00:00 AM
  • Firstpage
    4039
  • Lastpage
    4041
  • Abstract
    The configurational characteristics of thermomagnetically written domains under a static laser irradiation condition were observed by using a polarizing microscope. The shapes of the domains were categorized into three distinctly different types: (1) circular domains with size almost independent of the applied field, (2) domains growing in size and assuming smoother boundaries with increasing applied field, and (3) domains unrecordable at any condition. It was confirmed that the domain configurations were determined mainly by which one was the dominant controlling factor between demagnetizing and domain wall energy at elevated temperatures in the thermomagnetic recording process. The bit shape irregularity found in some alloys of TbFe was attributed to nonuniformity in magnetic properties inherent in the amorphous structure
  • Keywords
    cobalt alloys; ferrimagnetic properties of substances; iron alloys; magnetic domain walls; magnetic properties of amorphous substances; magnetic thin films; magneto-optical recording; optical microscopy; terbium alloys; TbFe alloy thin films; TbFeCo alloy thin films; amorphous structure; bit shape irregularity; circular domains; configurational characteristics; domain configurations; domain wall energy; static laser irradiation; thermomagnetic recording; Amorphous materials; Laser theory; Materials science and technology; Microscopy; Polarization; Saturation magnetization; Shape control; Sputtering; Temperature; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.42516
  • Filename
    42516