DocumentCode :
1012750
Title :
Molecular-beam-epitaxy-grown single-longitudinal-mode GaAs-AlGaAs interferometric lasers on stepped-channelled substrates
Author :
Minghuang Hong, J. ; Werner, Max Jonas ; Wu, Yao-Hwa ; Wang, Shyh
Author_Institution :
University of California, Department of Electrical Engineering & Computer Sciences and Electronic Research Laboratory, Berkeley, USA
Volume :
21
Issue :
24
fYear :
1985
Firstpage :
1138
Lastpage :
1140
Abstract :
The GaAs-AlGaAs double-heterostructure interferometric lasers were successfully grown by molecular beam epitaxy on [011]-oriented-stepped-channelled GaAs(100) substrates. These lasers have a side-mode suppression ratio of greater than 200:1.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; molecular beam epitaxial growth; semiconductor growth; semiconductor junction lasers; GaAs (100) substrate; GaAs-AlGaAs double-heterostructure interferometric lasers; molecular beam epitaxy; semiconductor laser; side-mode suppression ratio; single longitudinal mode lasers; stepped-channelled substrates;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850806
Filename :
4251662
Link To Document :
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