Title :
600V-IGBT3: trench field stop technology in 70 μm ultra thin wafer technology
Author :
Uthing, H.R. ; Umbach, F. ; Hellmund, O. ; Kanschat, P. ; Schmidt, G.
Author_Institution :
Infineon Technol. AG, Munchen, Germany
fDate :
6/17/2004 12:00:00 AM
Abstract :
The established trench field stop technology ´IGBT3´ is transferred to 600 V devices and supplements the 1200 V and 1700 V family. Besides an adjustment of cell geometry and pitch for the optimum compromise between on-state loss and short-circuit current, the ability to process ultrathin wafers with a thickness of 70 μm is the most demanding requirement for this device. One of the most important steps with the 600 V device is the extension of the maximum junction temperature to 175°C, which is an increase of 25°C over the more common IGBT chips.
Keywords :
III-V semiconductors; gallium arsenide; high electron mobility transistors; microwave power amplifiers; microwave power transistors; millimetre wave power amplifiers; millimetre wave power transistors; 1 to 60 GHz; GaAs; GaAs pHEMT process; microwave power transistor technology; millimetre-wave power transistor technology; multicarrier microwave power amplifiers;
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
DOI :
10.1049/ip-cds:20040457