DocumentCode :
1013212
Title :
Fe-C-O amorphous thin film by plasma CVD
Author :
Yoshinari, J. ; Morita, H. ; Tokuoka, Y.
Author_Institution :
TDK Corporation, Nenei, Saku-shi, Nagano, Japan
Volume :
21
Issue :
5
fYear :
1985
fDate :
9/1/1985 12:00:00 AM
Firstpage :
2047
Lastpage :
2049
Abstract :
Fe-C-O thin films were prepared by plasma CVD. The films were amorphous and had columnar structures. The magnetic characteristics measured in the plane were 4πMs=13.65 kgauss, 4πMr=1.84 kgauss and Hc= 40 Oe, but the coercive force measured vertically to the plane was nearly zero. On the other hand, Mössbauer measurement indicated that the average direction of magnetization was inclined at 30 degrees from the normal of the film. By a heat treatment in hydrogen atmosphere, the film transformed to αFe and Fe3C crystalline phases with a granular structure, and the directions of magnetization became random.
Keywords :
Amorphous magnetic films/devices; Plasma applications, materials processing; Amorphous magnetic materials; Amorphous materials; Atmospheric measurements; Coercive force; Force measurement; Magnetic films; Magnetization; Plasma measurements; Plasma properties; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1985.1064066
Filename :
1064066
Link To Document :
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