Title :
Fe-C-O amorphous thin film by plasma CVD
Author :
Yoshinari, J. ; Morita, H. ; Tokuoka, Y.
Author_Institution :
TDK Corporation, Nenei, Saku-shi, Nagano, Japan
fDate :
9/1/1985 12:00:00 AM
Abstract :
Fe-C-O thin films were prepared by plasma CVD. The films were amorphous and had columnar structures. The magnetic characteristics measured in the plane were 4πMs=13.65 kgauss, 4πMr=1.84 kgauss and Hc= 40 Oe, but the coercive force measured vertically to the plane was nearly zero. On the other hand, Mössbauer measurement indicated that the average direction of magnetization was inclined at 30 degrees from the normal of the film. By a heat treatment in hydrogen atmosphere, the film transformed to αFe and Fe3C crystalline phases with a granular structure, and the directions of magnetization became random.
Keywords :
Amorphous magnetic films/devices; Plasma applications, materials processing; Amorphous magnetic materials; Amorphous materials; Atmospheric measurements; Coercive force; Force measurement; Magnetic films; Magnetization; Plasma measurements; Plasma properties; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1985.1064066