A high-performance micro-GRIN-chip spot-size converter formed with focused ion beam

Author

Yoda, H. ; Ikedo, H. ; Ketsuka, T. ; Irie, A. ; Shiraishi, K. ; Tsai, C.S.

Author_Institution

Graduate Sch. of Eng., Utsunomiya Univ., Japan

Volume

18

Issue

14

fYear

2006

fDate

7/1/2006 12:00:00 AM

Firstpage

1554

Lastpage

1556

Abstract

A high-performance spot-size converter composed of a micrograded-index slab chip with a hemi-cylindrical endface for conversion between single-mode fibers (SMFs) and fine-core waveguides has been fabricated using the focused ion beam etching technique. The microchip has the index difference as much as 1.8 in the index-gradient direction and the input hemi-cylindrical endface of curvature radius as small as 6.3 μm. The measured full width at the 1/e² maximum of the resulting focused spot intensity distribution is 1.8×2.5 μm² when the input end is excited by an SMF of 10.8-μm-spot diameter at the wavelength of 1.55 μm.

Keywords

focused ion beam technology; gradient index optics; micro-optics; optical fabrication; optical fibre couplers; optical waveguides; refractive index; sputter etching; 1.55 mum; 10.8 mum; 6.3 mum; curvature radius; fine-core waveguides; focused ion beam etching; focused spot intensity distribution; index-gradient direction; microGRIN-chip spot-size converter; single-mode fibers; Etching; Integrated optics; Ion beams; Optical fibers; Optical refraction; Optical variables control; Optical waveguides; Refractive index; Silicon; Slabs; Optical beam focusing; optical fiber connecting; optical fibers; optical propagation in nonhomogeneous media; optical waveguides; spot size;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2006.878150

Filename

1650278