Title :
A high-performance micro-GRIN-chip spot-size converter formed with focused ion beam
Author :
Yoda, H. ; Ikedo, H. ; Ketsuka, T. ; Irie, A. ; Shiraishi, K. ; Tsai, C.S.
Author_Institution :
Graduate Sch. of Eng., Utsunomiya Univ., Japan
fDate :
7/1/2006 12:00:00 AM
Abstract :
A high-performance spot-size converter composed of a micrograded-index slab chip with a hemi-cylindrical endface for conversion between single-mode fibers (SMFs) and fine-core waveguides has been fabricated using the focused ion beam etching technique. The microchip has the index difference as much as 1.8 in the index-gradient direction and the input hemi-cylindrical endface of curvature radius as small as 6.3 μm. The measured full width at the 1/e2 maximum of the resulting focused spot intensity distribution is 1.8×2.5 μm2 when the input end is excited by an SMF of 10.8-μm-spot diameter at the wavelength of 1.55 μm.
Keywords :
focused ion beam technology; gradient index optics; micro-optics; optical fabrication; optical fibre couplers; optical waveguides; refractive index; sputter etching; 1.55 mum; 10.8 mum; 6.3 mum; curvature radius; fine-core waveguides; focused ion beam etching; focused spot intensity distribution; index-gradient direction; microGRIN-chip spot-size converter; single-mode fibers; Etching; Integrated optics; Ion beams; Optical fibers; Optical refraction; Optical variables control; Optical waveguides; Refractive index; Silicon; Slabs; Optical beam focusing; optical fiber connecting; optical fibers; optical propagation in nonhomogeneous media; optical waveguides; spot size;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2006.878150
