DocumentCode :
1013696
Title :
Analytical bias dependent noise model for InP HEMT´s
Author :
Klepser, Bernd-Ulrich H. ; Bergamaschi, Crispino ; Schefer, Matthias ; Diskus, Christian G. ; Patrick, William ; Bachtold, Werner
Author_Institution :
Lab. for Electromagn. Fields & Microwave Electron., Swiss Federal Inst. of Technol., Zurich, Switzerland
Volume :
42
Issue :
11
fYear :
1995
fDate :
11/1/1995 12:00:00 AM
Firstpage :
1882
Lastpage :
1889
Abstract :
A practical device model for both high frequency small signal and noise behavior of InP-HEMT´s depending on both gate and drain voltage has been developed. The model is based on the two-piece linear approximation using charge control and saturation velocity models. Combining large signal model and analytical expressions for the noise source parameter P, R, and C, an analytical bias-dependent noise model can be obtained. For implementation into high frequency simulation software, the exact calculated bias dependence was mathematically fitted by elementary functions. It could be shown that lowest noise is observed when the drain current for maximum gain is reduced to a third while the drain voltage is reduced to the start of the saturation region Vds =0.6 V. Modeling scaling effects of the noise behavior shows that lowest noise is observed for a gate width of 1×40 μm. Multi-finger layouts are preferable for gate widths above 70 μm. Furthermore it is shown, that the optimum width of each finger decreases with the number of fingers
Keywords :
III-V semiconductors; high electron mobility transistors; indium compounds; semiconductor device models; semiconductor device noise; InP; InP HEMTs; analytical bias dependent noise model; charge control; high frequency simulation software; large signal model; multi-finger layouts; scaling; small signal model; two-piece linear approximation; velocity saturation; Analytical models; Fingers; Frequency; HEMTs; Indium phosphide; Linear approximation; Noise reduction; Signal analysis; Velocity control; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.469392
Filename :
469392
Link To Document :
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