Realization of an Ultracompact Low-Loss Photonic Crystal Corner Mirror

Author

Yu, Hejun ; Yu, Jinzhong ; Fan, Zhongchao ; Chen, Shaowu

Author_Institution

Chinese Acad. of Sci., Beijng

Volume

19

Issue

14

fYear

2007

fDate

7/15/2007 12:00:00 AM

Firstpage

1042

Lastpage

1044

Abstract

We report on the realization and characterization of an ultracompact, low-loss, and broadband corner mirror based on photonic crystals (PCs). By modifying the boundary layers of the PC region, extra losses of dB per corner mirror are achieved for transverse-electronic polarization for silicon-on-insulator ridge waveguides fabricated by electron beam lithography and inductively coupled plasma etching. Dimensions of the PC corner mirror are less than, which are only about one tenth of conventional waveguide corner mirrors.

Keywords

electron beam lithography; integrated optics; mirrors; optical fabrication; optical losses; optical materials; optical waveguide components; photonic crystals; ridge waveguides; silicon-on-insulator; sputter etching; broadband photonic crystal corner mirror; electron beam lithography; inductively coupled plasma etching; silicon-on-insulator ridge waveguide fabrication; transverse-electronic polarization; ultracompact low-loss corner mirror; Electron beams; Lithography; Mirrors; Optical coupling; Optical losses; Personal communication networks; Photonic crystals; Plasma applications; Polarization; Silicon on insulator technology; Corner mirror; photonic crystal (PC); silicon-on-insulator (SOI);

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2007.899459

Filename

4252148