Title :
A Study of Plasma-Stabilized Diffusion Flames at Elevated Ambient Temperatures
Author :
Kim, Wookyung ; Do, Hyungrok ; Mungal, M. Godfrey ; Cappelli, Mark A.
Author_Institution :
Dept. of Mech. Eng., Stanford Univ., Stanford, CA
Abstract :
We report on a study of the use of repetitive ultrashort pulsed plasma discharges in stabilizing a lifted methane jet diffusion flame in elevated temperature (855 K-975 K) vitiated coflow. CH chemiluminescence images are used to record the flame liftoff height, which serves as a measure of the flame stability. The results show that, for the same reduced electric field (E /n), the stabilizing ability of the discharge in the investigated temperature range diminishes with increasing coflow temperature. Based on the results of a zero-dimensional transient chemistry simulation, it is conjectured that the reduced propensity for stabilization at elevated temperature is caused by the rapid depletion of H2 and CO formed in the postplasma gas, under high ambient temperature conditions.
Keywords :
chemiluminescence; discharges (electric); flames; plasma simulation; chemiluminescence images; coflow temperature; discharge stabilizing ability; elevated ambient temperatures; flame liftoff height; flame stability; lifted methane jet diffusion flame; plasma-stabilized diffusion flames; reduced electric field; repetitive ultrashort pulsed plasma discharges; temperature 855 K to 975 K; zero-dimensional transient chemistry simulation; Combustion; Fires; Mechanical engineering; Plasma applications; Plasma chemistry; Plasma measurements; Plasma simulation; Plasma stability; Plasma temperature; Temperature distribution; Elevated temperature; flame stability; plasma-assisted augmentor; plasma-assisted diffusion flame;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2008.2004345
