Title :
Size influence on the propagation loss induced by sidewall roughness in ultrasmall SOI waveguides
Author :
Grillot, F. ; Vivien, L. ; Laval, S. ; Pascal, D. ; Cassan, E.
Author_Institution :
Inst. d´´Electronique Fondamentale, Univ. Paris-Sud, Orsay, France
fDate :
7/1/2004 12:00:00 AM
Abstract :
Silicon-on-insulator (SOI) optical waveguides with high electromagnetic field confinement suffer from sidewall roughness which is responsible for strong scattering effects. This letter reports a numerical investigation on the size influence of ultrasmall SOI waveguides on the propagation loss due to sidewall roughness. It is shown that for a size smaller than 260 × 260 nm the roughness-induced propagation loss decreases. As the optical mode confinement is reduced, a very low loss light coupling from and to a single-mode fiber can be achieved with propagation loss as low as 0.5 dB/cm for a 150 × 150 nm cross-sectional waveguide.
Keywords :
integrated optoelectronics; optical fibre couplers; optical fibre losses; optical planar waveguides; silicon-on-insulator; surface roughness; 150 nm; 260 nm; electromagnetic field confinement; integrated optoelectronics; low loss light coupling; optical mode confinement; optical waveguides; propagation loss; scattering effects; sidewall roughness; silicon-on-insulator; single-mode fiber; size influence; ultrasmall SOI waveguides; Electromagnetic fields; Electromagnetic scattering; Electromagnetic waveguides; Light scattering; Optical coupling; Optical fiber losses; Optical scattering; Optical waveguides; Propagation losses; Silicon on insulator technology;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2004.828497