DocumentCode :
1016169
Title :
On the Interpretation of Local Negative Mobilities in Nanoscale Semiconductor Devices
Author :
Brugger, Simon C. ; Schenk, Andreas
Author_Institution :
ETH Zurich, Zurich
Volume :
54
Issue :
7
fYear :
2007
fDate :
7/1/2007 12:00:00 AM
Firstpage :
1766
Lastpage :
1770
Abstract :
In a previous theoretical work, the concept of mobility has been unequivocally extended to inhomogeneous nonequilibrium systems. This generalization naturally suggests a new one-particle Monte Carlo method to solve the Boltzmann equation, which can self-consistently take into account generation-recombination processes, as well as quantum corrections. This new scheme has been successfully applied to different kinds of MOSFETs. The results of the simulations clearly show that, surprisingly, the mobility in the channel can become negative. In this brief, we present a detailed analysis of this phenomenon and show that negative mobilities are directly related to regions, where quasi-ballistic transport takes place.
Keywords :
Boltzmann equation; MOSFET; Monte Carlo methods; Boltzmann equation; MOSFET; Monte Carlo method; channel mobility; generation-recombination processes; inhomogeneous nonequilibrium systems; local negative mobilities; nanoscale semiconductor devices; quantum corrections; quasiballistic transport; Boltzmann equation; Current density; Distribution functions; Electrons; Inverse problems; MOSFETs; Nanoscale devices; Radiative recombination; Scattering; Semiconductor devices; Boltzmann equation (BE); inverse scattering operator (ISO); negative mobility; quasi-ballistic transport;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.898241
Filename :
4252357
Link To Document :
بازگشت