Title :
High rate preparation of Co-Cr recording media on continuous film substrates
Author :
Kume, M. ; Kishimoto, D. ; Nakatsuka, Y. ; Abe, Y. ; Nakatsuka, Yasushi ; Abe, Y.
Author_Institution :
Sanyo Electric Co., Ltd., Osaka, Japan
fDate :
9/1/1986 12:00:00 AM
Abstract :
The properties of Co-Cr thin films prepared by Targets Facing Type of Sputtering method at a high deposition rate up to 1.9 µm/min. have been characterized by vibrating sample magnetometer (VSM) and X-ray diffraction. Magnetic properties of these films are independent of depositon rate, while the HCP
Keywords :
Anisotropic magnetoresistance; Coercive force; Crystallization; Helium; Impurities; Magnetic films; Magnetic properties; Magnetization; Sputtering; Substrates;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1986.1064342
