DocumentCode
1016432
Title
Accurate Gate Impedance Determination on Ultraleaky MOSFETs by Fitting to a Three-Lumped-Parameter Model atFrequencies From DC to RF
Author
Andrés, Enrique San ; Pantisano, Luigi ; Ramos, Javier ; Roussel, Philippe J. ; O´Sullivan, Barry J. ; Toledano-Luque, Maria ; DeGendt, Stefan ; Groeseneken, Guido
Author_Institution
Univ. Complutense de Madrid, Madrid
Volume
54
Issue
7
fYear
2007
fDate
7/1/2007 12:00:00 AM
Firstpage
1705
Lastpage
1712
Abstract
We present an experimental methodology that demonstrates the suitability of the conventional three-lumped- parameter model for gate impedance of MOSFET devices at frequencies from dc to the gigahertz range, which permits accurate extraction of model parameters. The parasitic effects at a high frequency are minimized by using radio frequency techniques (i.e., short return paths and de-embedding structures), whereas a robust parameter extraction algorithm overcomes possible instrument inaccuracies. When combined, these allow simultaneous extraction of all three parameters (i.e., Cgate, RDT and Rseries) from the model. The technique is applied to conventional SiO2 -based MOSFET devices and to ultraleaky HfO2 devices with aggressively scaled gate dielectric thickness.
Keywords
MOSFET; capacitance measurement; hafnium compounds; lumped parameter networks; silicon compounds; HfO2 - Interface; MOSFET; SiO2 - Interface; gate dielectric thickness; gate impedance determination; parameter extraction; parasitic effects; three-lumped-parameter model; Capacitance measurement; Current measurement; Dielectric measurements; Frequency measurement; Impedance; Instruments; MOSFETs; Probes; Radio frequency; Thickness measurement; Capacitance measurement; MOSFET; radio frequency (RF); ultrathin gate dielectric;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2007.898473
Filename
4252382
Link To Document