Title :
Accurate Gate Impedance Determination on Ultraleaky MOSFETs by Fitting to a Three-Lumped-Parameter Model atFrequencies From DC to RF
Author :
Andrés, Enrique San ; Pantisano, Luigi ; Ramos, Javier ; Roussel, Philippe J. ; O´Sullivan, Barry J. ; Toledano-Luque, Maria ; DeGendt, Stefan ; Groeseneken, Guido
Author_Institution :
Univ. Complutense de Madrid, Madrid
fDate :
7/1/2007 12:00:00 AM
Abstract :
We present an experimental methodology that demonstrates the suitability of the conventional three-lumped- parameter model for gate impedance of MOSFET devices at frequencies from dc to the gigahertz range, which permits accurate extraction of model parameters. The parasitic effects at a high frequency are minimized by using radio frequency techniques (i.e., short return paths and de-embedding structures), whereas a robust parameter extraction algorithm overcomes possible instrument inaccuracies. When combined, these allow simultaneous extraction of all three parameters (i.e., Cgate, RDT and Rseries) from the model. The technique is applied to conventional SiO2 -based MOSFET devices and to ultraleaky HfO2 devices with aggressively scaled gate dielectric thickness.
Keywords :
MOSFET; capacitance measurement; hafnium compounds; lumped parameter networks; silicon compounds; HfO2 - Interface; MOSFET; SiO2 - Interface; gate dielectric thickness; gate impedance determination; parameter extraction; parasitic effects; three-lumped-parameter model; Capacitance measurement; Current measurement; Dielectric measurements; Frequency measurement; Impedance; Instruments; MOSFETs; Probes; Radio frequency; Thickness measurement; Capacitance measurement; MOSFET; radio frequency (RF); ultrathin gate dielectric;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2007.898473