DocumentCode :
1016535
Title :
Improved CV/I Methodology to Accurately Predict CMOS Technology Performance
Author :
Yeh, Ping-Chin ; Nayak, Deepak K. ; Gitlin, Daniel
Author_Institution :
Xilinx Inc., San Jose
Volume :
54
Issue :
7
fYear :
2007
fDate :
7/1/2007 12:00:00 AM
Firstpage :
1760
Lastpage :
1762
Abstract :
Conventional CV/I methodology is shown to be inadequate in projecting circuit performance of advanced technologies. The calculation can result in over 100% error on performance estimates compared to the silicon data. In this brief, we present an improved CV/I model that predicts performance within 3% error against ring oscillator delays over different technology nodes. The model is highly scalable and can be used as figure of merit for future technology performance assessment.
Keywords :
CMOS integrated circuits; integrated circuit modelling; CMOS technology performance; CV/I methodology; CV/I model; figure of merit; ring oscillator delays; silicon data; CMOS technology; Circuit optimization; Delay; Inverters; Parasitic capacitance; Performance gain; Ring oscillators; Semiconductor device modeling; Silicon; Transistors; CMOS; delay; figure of merit (FOM); model; technology assessment; transistor;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.898043
Filename :
4252391
Link To Document :
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