Title : 
RF Characteristics of a high-performance, 10-fF/μm2 capacitor in a deep trench
         
        
            Author : 
Cai, W.Z. ; Shastri, S. ; Grivna, G. ; Yujing Wu ; Loechelt, G.
         
        
            Author_Institution : 
ON Semicond. Corp., Phoenix, AZ, USA
         
        
        
        
        
            fDate : 
7/1/2004 12:00:00 AM
         
        
        
        
            Abstract : 
We report the properties of a novel polysilicon-insulator-polysilicon trench capacitor with a 380-/spl Aring/ Si3N4 dielectric that is designed and fabricated for high-frequency bypass and decoupling applications. The capacitor has a specific capacitance as high as 10 fF/μm2 normalized to its footprint area, and a breakdown voltage greater than 15 V at room temperature. The measured S-parameters are in excellent agreement with simulations of an equivalent circuit model that includes a shunt substrate resistance to ground (R/sub sub/). A geometric factor μ is defined as the ratio of the imaginary parts of Y/sub 11/ and -Y/sub 21/ at low frequency. The values of μ and, consequently, R/sub sub/ are extracted from fitting the measured S-parameter data, and the layout dependence of μ and R/sub sub/ is also explained by the model.
         
        
            Keywords : 
S-parameters; capacitors; equivalent circuits; semiconductor device breakdown; semiconductor device models; semiconductor-insulator-semiconductor devices; silicon compounds; 380 A; S-parameter; Si/sub 3/N/sub 4/; breakdown voltage; footprint area; layout dependence; monolithic microwave integrated circuits; radiofrequency device; shunt substrate resistance; trench capacitor; Capacitance; Capacitors; Circuit simulation; Dielectric measurements; Electrical resistance measurement; Equivalent circuits; Land surface temperature; Radio frequency; Scattering parameters; Temperature measurement;
         
        
        
            Journal_Title : 
Electron Device Letters, IEEE
         
        
        
        
        
            DOI : 
10.1109/LED.2004.831195