Title :
Engineering quantum confinement and orbital couplings in laterally coupled vertical quantum dots for spintronic applications
Author :
Kim, J. ; Matagne, P. ; Leburton, Jean-Pierre ; Martin, R.M. ; Hatano, T. ; Tarucha, S.
Author_Institution :
Beckman Inst. for Adv. Sci. & Technol., Illinois Univ., Urbana, IL
fDate :
7/1/2006 12:00:00 AM
Abstract :
We use three-dimensional self-consistent Kohn-Sham´s equations coupled with Poisson´s equation to investigate the electrical behavior of laterally coupled vertical quantum dots (LCVQD) for spin-qubit operation. The shape and the depth of the central gate are changed in different ways to correlate gate geometry with the coupling between the two quantum dots. Upon comparing LCVQD single-gate and the split-gate structures, we found that the two inherently different designs result in different energy barrier profiles leading to dissimilar wavefunction coupling between the two dots. Finally, we show that the doping concentrations in the layered structure could be optimized for practical two-qubit operation
Keywords :
III-V semiconductors; Poisson equation; doping profiles; gallium arsenide; magnetoelectronics; quantum computing; quantum theory; semiconductor quantum dots; 3D self-consistent Kohn-Sham equations; GaAs; Poisson equation; doping concentrations; energy barrier profiles; engineering quantum confinement; gallium compounds; laterally coupled vertical quantum dots; layered structure; orbital couplings; quantum computing; quantum effect semiconductor devices; quantum theory; semiconductor device modeling; semiconductor heterojunctions; spin-qubit operation; spintronic applications; split-gate structures; wavefunction coupling; Electrons; Magnetoelectronics; Physics; Poisson equations; Potential well; Quantum computing; Quantum dots; Quantum mechanics; Split gate flash memory cells; US Department of Transportation; Gallium compounds; quantum dots; quantum effect semiconductor devices; quantum theory; semiconductor device modeling; semiconductor heterojunctions;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2006.877017