• DocumentCode
    1017954
  • Title

    Surface stability of GaAs during tin diffusion

  • Author

    Tuck, Brian ; Badawi, M.H.

  • Author_Institution
    Nottingham University, Department of Electrical & Electronic Engineering, Nottingham, UK
  • Volume
    15
  • Issue
    19
  • fYear
    1979
  • Firstpage
    604
  • Lastpage
    606
  • Abstract
    Experiments are described in which tin was diffused into GaAs in a closed ampoule. When the ambient arsenic vapour pressure was low the results were not reproducible, and severe deterioration of the surface was observed. Evidence is produced which suggests that both evaporation and condensation occurred during these diffusions. The problem was completely solved by employing a high-vapour pressure of arsenic. It is suggested that a gallium-rich surface is less stable than one which is arsenic-rich.
  • Keywords
    III-V semiconductors; diffusion in solids; gallium arsenide; semiconductor doping; surface structure; tin; GaAs; Sn diffusion; ambient arsenic vapour pressure; condensation; evaporation; semiconductor doping; surface stability;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19790434
  • Filename
    4256042