DocumentCode
1017954
Title
Surface stability of GaAs during tin diffusion
Author
Tuck, Brian ; Badawi, M.H.
Author_Institution
Nottingham University, Department of Electrical & Electronic Engineering, Nottingham, UK
Volume
15
Issue
19
fYear
1979
Firstpage
604
Lastpage
606
Abstract
Experiments are described in which tin was diffused into GaAs in a closed ampoule. When the ambient arsenic vapour pressure was low the results were not reproducible, and severe deterioration of the surface was observed. Evidence is produced which suggests that both evaporation and condensation occurred during these diffusions. The problem was completely solved by employing a high-vapour pressure of arsenic. It is suggested that a gallium-rich surface is less stable than one which is arsenic-rich.
Keywords
III-V semiconductors; diffusion in solids; gallium arsenide; semiconductor doping; surface structure; tin; GaAs; Sn diffusion; ambient arsenic vapour pressure; condensation; evaporation; semiconductor doping; surface stability;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19790434
Filename
4256042
Link To Document