DocumentCode :
1017954
Title :
Surface stability of GaAs during tin diffusion
Author :
Tuck, Brian ; Badawi, M.H.
Author_Institution :
Nottingham University, Department of Electrical & Electronic Engineering, Nottingham, UK
Volume :
15
Issue :
19
fYear :
1979
Firstpage :
604
Lastpage :
606
Abstract :
Experiments are described in which tin was diffused into GaAs in a closed ampoule. When the ambient arsenic vapour pressure was low the results were not reproducible, and severe deterioration of the surface was observed. Evidence is produced which suggests that both evaporation and condensation occurred during these diffusions. The problem was completely solved by employing a high-vapour pressure of arsenic. It is suggested that a gallium-rich surface is less stable than one which is arsenic-rich.
Keywords :
III-V semiconductors; diffusion in solids; gallium arsenide; semiconductor doping; surface structure; tin; GaAs; Sn diffusion; ambient arsenic vapour pressure; condensation; evaporation; semiconductor doping; surface stability;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19790434
Filename :
4256042
Link To Document :
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