DocumentCode :
1018496
Title :
Minority carrier injection characteristics of the diffused emitter junction
Author :
Kennedy, D.P. ; Murley, P.C.
Author_Institution :
IBM Corporation, Poughkeepsie, N. Y.
Volume :
9
Issue :
2
fYear :
1962
fDate :
3/1/1962 12:00:00 AM
Firstpage :
136
Lastpage :
142
Abstract :
For the double-diffused transistor, a one-dimensional analysis is presented on the minority carrier injection properties of a diffused emitter junction. This junction is bounded on one side by a reverse biased collector and on the other by an ohmic contact of arbitrary recombination velocity. Furthermore, arbitrary magnitudes of minority carrier lifetime are assumed in both the emitter and base regions of this semiconductor device. Injection efficiency characteristics are graphically illustrated throughout a wide range of physical and geometrical parameters. Assuming, for example, variations in the emitter junction depth, injection properties are demonstrated for transistors exhibiting a fixed collector location and also for transistors exhibiting a fixed base width. A comparison is also shown between the calculated minority carrier injection from this analysis and from other, more approximate, methods.
Keywords :
Atomic layer deposition; Charge carrier lifetime; Electrical resistance measurement; Electron devices; Equations; Geometry; Impurities; Information analysis; Ohmic contacts; P-n junctions; Radiative recombination; Semiconductor devices; Space charge;
fLanguage :
English
Journal_Title :
Electron Devices, IRE Transactions on
Publisher :
ieee
ISSN :
0096-2430
Type :
jour
DOI :
10.1109/T-ED.1962.14961
Filename :
1473189
Link To Document :
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