DocumentCode :
1019399
Title :
Vacuum deposition of Co-Cr perpendicular anisotropy films on polymer substrates treated with ion beam
Author :
Sugita, R. ; Tohma, K. ; Honda, K. ; Kawawake, Y. ; Echigo, N. ; Murakami, Y.
Author_Institution :
Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
Volume :
25
Issue :
5
fYear :
1989
fDate :
9/1/1989 12:00:00 AM
Firstpage :
4183
Lastpage :
4185
Abstract :
The author investigated the effect of ion-beam treatment of polymer substrate surfaces on magnetic properties, microstructure, adhesive force, and recording performances of vacuum-deposited Co-Cr films. Films which are deposited on the ion-beam-treated substrates have higher Hc⊥ than that of the films on untreated substrates without the treatment and have Hkeff values high enough for perpendicular magnetic recording applications. With ion-beam treatment the adhesive force of the Co-Cr films is considerably improved, becoming of practical strength. The films deposited on the treated substrates reproduced voltage as high as that of Co-Cr films with Ti underlayer. Ion-beam treatment of the polymer substrates therefore makes both glow discharge treatment and the use of a Ti underlayer unnecessary and promises high manufacturing productivity
Keywords :
chromium alloys; cobalt alloys; ferromagnetic properties of substances; ion beam effects; magnetic recording; magnetic thin films; vacuum deposited coatings; Co-Cr perpendicular anisotropy films; adhesive force; high manufacturing productivity; ion-beam treatment; ion-beam-treated substrates; magnetic properties; microstructure; perpendicular magnetic recording; perpendicular recording; polymer substrates; recording performances; reproduced voltage; vacuum-deposited Co-Cr films; Anisotropic magnetoresistance; Glow discharges; Magnetic films; Magnetic properties; Manufacturing; Microstructure; Perpendicular magnetic recording; Polymer films; Surface treatment; Voltage;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.42562
Filename :
42562
Link To Document :
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