• DocumentCode
    1019399
  • Title

    Vacuum deposition of Co-Cr perpendicular anisotropy films on polymer substrates treated with ion beam

  • Author

    Sugita, R. ; Tohma, K. ; Honda, K. ; Kawawake, Y. ; Echigo, N. ; Murakami, Y.

  • Author_Institution
    Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
  • Volume
    25
  • Issue
    5
  • fYear
    1989
  • fDate
    9/1/1989 12:00:00 AM
  • Firstpage
    4183
  • Lastpage
    4185
  • Abstract
    The author investigated the effect of ion-beam treatment of polymer substrate surfaces on magnetic properties, microstructure, adhesive force, and recording performances of vacuum-deposited Co-Cr films. Films which are deposited on the ion-beam-treated substrates have higher Hc⊥ than that of the films on untreated substrates without the treatment and have Hkeff values high enough for perpendicular magnetic recording applications. With ion-beam treatment the adhesive force of the Co-Cr films is considerably improved, becoming of practical strength. The films deposited on the treated substrates reproduced voltage as high as that of Co-Cr films with Ti underlayer. Ion-beam treatment of the polymer substrates therefore makes both glow discharge treatment and the use of a Ti underlayer unnecessary and promises high manufacturing productivity
  • Keywords
    chromium alloys; cobalt alloys; ferromagnetic properties of substances; ion beam effects; magnetic recording; magnetic thin films; vacuum deposited coatings; Co-Cr perpendicular anisotropy films; adhesive force; high manufacturing productivity; ion-beam treatment; ion-beam-treated substrates; magnetic properties; microstructure; perpendicular magnetic recording; perpendicular recording; polymer substrates; recording performances; reproduced voltage; vacuum-deposited Co-Cr films; Anisotropic magnetoresistance; Glow discharges; Magnetic films; Magnetic properties; Manufacturing; Microstructure; Perpendicular magnetic recording; Polymer films; Surface treatment; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.42562
  • Filename
    42562