DocumentCode :
1019705
Title :
Analytic model of I-V Characteristics of 4H-SiC MESFETs based on multiparameter mobility model
Author :
Lv, Hongliang ; Zhang, Yimen ; Zhang, Yuming ; Yang, Lin-An
Author_Institution :
Microelectron. Inst., Xidian Univ., Xi´´an, China
Volume :
51
Issue :
7
fYear :
2004
fDate :
7/1/2004 12:00:00 AM
Firstpage :
1065
Lastpage :
1068
Abstract :
A physical analytic model is developed for behavior of electron transport, and for the output current-voltage (I-V ) characteristics in 4H-SiC metal-semiconductor field-effect transistors (MESFETs). In this model, different analytical expressions are used for the electron mobility as a function of electric field and for the velocity-field relationship. Compared with the empirical three-parameter model, the multiparameter mobility model proposed in this paper is comparatively more realistic, since it better reproduces the drift velocity-field characteristics obtained by Monte Carlo (MC) calculations. Thus, the resulting I-V characteristics are in excellent agreement with experimental data.
Keywords :
III-V semiconductors; indium compounds; resonant tunnelling; resonant tunnelling diodes; temperature measurement; 0.6 to 2.0 nm; 223 to 423 K; InAs-AlSb-GaSb; current-voltage characteristics; peak current density; peak voltage; resonant interband tunnel diodes; resonant tunneling; temperature dependence; temperature performance; tunnel barrier thickness; valley current density; valley voltage; Acoustic scattering; Analytical models; Electron mobility; FETs; Impurities; MESFETs; Optical scattering; Phonons; Silicon carbide; Temperature; MESFET; Metal–semiconductor field-effect ransistor; SiC; scattering; semiconductor device modeling; silicon carbide; velocity-field relationship;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2004.829859
Filename :
1308627
Link To Document :
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