DocumentCode
1020084
Title
High Voltage (3130 V) 4H-SiC Lateral p-n Diodes on a Semiinsulating Substrate
Author
Huang, Chih-Fang ; Kuo, Jin-Rong ; Tsai, Chih-Chung
Author_Institution
Nat. Tsing Hua Univ., Hsinchu
Volume
29
Issue
1
fYear
2008
Firstpage
83
Lastpage
85
Abstract
High-voltage 4H-SiC lateral p-n diodes based on the superjunction principle are fabricated on a semiinsulating substrate for the first time. Experimental results reveal that the length of the field plates on the cathode side and the location of the anode contact are crucial in obtaining a high breakdown voltage. The BV2/R on of these devices is 19 MW/cm2. The best achieved blocking voltage is 3130 V, which is the highest value ever reported on SiC lateral devices.
Keywords
power semiconductor diodes; silicon compounds; wide band gap semiconductors; SiC; anode contact; blocking voltage; breakdown voltage; cathode; lateral p-n diodes; semi-insulating substrate; superjunction principle; voltage 3130 V; Anodes; Cathodes; Diodes; Doping; Dry etching; Immune system; MOS capacitors; Silicon carbide; Substrates; Voltage; 4H-SiC; Diode; high voltage; lateral; semiinsulating substrate; superjunction;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2007.910756
Filename
4408731
Link To Document