DocumentCode :
1020084
Title :
High Voltage (3130 V) 4H-SiC Lateral p-n Diodes on a Semiinsulating Substrate
Author :
Huang, Chih-Fang ; Kuo, Jin-Rong ; Tsai, Chih-Chung
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu
Volume :
29
Issue :
1
fYear :
2008
Firstpage :
83
Lastpage :
85
Abstract :
High-voltage 4H-SiC lateral p-n diodes based on the superjunction principle are fabricated on a semiinsulating substrate for the first time. Experimental results reveal that the length of the field plates on the cathode side and the location of the anode contact are crucial in obtaining a high breakdown voltage. The BV2/R on of these devices is 19 MW/cm2. The best achieved blocking voltage is 3130 V, which is the highest value ever reported on SiC lateral devices.
Keywords :
power semiconductor diodes; silicon compounds; wide band gap semiconductors; SiC; anode contact; blocking voltage; breakdown voltage; cathode; lateral p-n diodes; semi-insulating substrate; superjunction principle; voltage 3130 V; Anodes; Cathodes; Diodes; Doping; Dry etching; Immune system; MOS capacitors; Silicon carbide; Substrates; Voltage; 4H-SiC; Diode; high voltage; lateral; semiinsulating substrate; superjunction;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2007.910756
Filename :
4408731
Link To Document :
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