DocumentCode
1020370
Title
Floating substrate effects on speed performance in scaled CMOS/SOS circuits
Author
Hatano, Hiroshi
Author_Institution
Toshiba Corporation, Semiconductor Device Engineering Laboratory, Research & Development Center, Kawasaki, Japan
Volume
22
Issue
4
fYear
1986
Firstpage
177
Lastpage
179
Abstract
Floating substrate effects on speed degradation in 2 ¿m SOS circuits have been investigated. It has been found that the drain-substrate capacitive coupling is dominant in highly doped substrate devices, based on experimental results obtained from CMOS ring oscillators. Cycle-time-dependent sense amplifier output transition times have also been explained by this capacitive coupling.
Keywords
CMOS integrated circuits; VLSI; 2 micron design rules; VLSI; cycle-time dependence; doped substrate devices; drain-substrate capacitive coupling; floating substrate effects; monolithic IC; output transition times; scaled CMOS/SOS circuits; sense amplifier; speed performance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19860124
Filename
4256311
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