• DocumentCode
    1020432
  • Title

    Reduction of floating substrate effect in thin-film SOI MOSFETs

  • Author

    Colinge, J.-P.

  • Author_Institution
    Hewlett-Packard Laboratories, Palo Alto, USA
  • Volume
    22
  • Issue
    4
  • fYear
    1986
  • Firstpage
    187
  • Lastpage
    188
  • Abstract
    The presence of a floating substrate in SOI transistors gives rise to a decrease of threshold voltage when drain voltage is increased. When the devices are made in a very thin silicon film, the latter is completely depleted when the device is in the ´on´ state, and no part of the film can act as a floating substrate. This brings about a dramatic decrease of the so-called ´kink effect´.
  • Keywords
    insulated gate field effect transistors; thin film transistors; MOSFETs; SOI transistors; floating substrate effect; kink effect; thin film type; threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19860130
  • Filename
    4256317