DocumentCode
1020432
Title
Reduction of floating substrate effect in thin-film SOI MOSFETs
Author
Colinge, J.-P.
Author_Institution
Hewlett-Packard Laboratories, Palo Alto, USA
Volume
22
Issue
4
fYear
1986
Firstpage
187
Lastpage
188
Abstract
The presence of a floating substrate in SOI transistors gives rise to a decrease of threshold voltage when drain voltage is increased. When the devices are made in a very thin silicon film, the latter is completely depleted when the device is in the ´on´ state, and no part of the film can act as a floating substrate. This brings about a dramatic decrease of the so-called ´kink effect´.
Keywords
insulated gate field effect transistors; thin film transistors; MOSFETs; SOI transistors; floating substrate effect; kink effect; thin film type; threshold voltage;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19860130
Filename
4256317
Link To Document