DocumentCode
1020493
Title
Controlled stepwise motion in polysilicon microstructures
Author
Akiyama, Terunobu ; Shono, Katsufusa
Author_Institution
Dept. of Electr. & Electron. Eng., Sophia Univ., Tokyo, Japan
Volume
2
Issue
3
fYear
1993
fDate
9/1/1993 12:00:00 AM
Firstpage
106
Lastpage
110
Abstract
This paper presents a polysilicon slider and a rotor capable of stepwise motion. These devices were fabricated on a silicon wafer with surface micromachine technology. The proportional relation between the velocity of motion and the frequency of the applied pulse was experimentally confirmed. The peak value of the applied pulse determines the step length. The step values observed were in the range of 10-30 nm for a bushing height of 1.0 μm and of 40-80 nm for a bushing height of 2.0 μm depending on the peak voltage of the applied pulse
Keywords
elemental semiconductors; micromechanical devices; semiconductor technology; silicon; small electric machines; stepping motors; 1 mum; 10 to 30 nm; 2 mum; 40 to 80 nm; Si; Si wafer; bushing height; controlled stepwise motion; micromotor; peak value; peak voltage; polysilicon microstructures; polysilicon slider; proportional relation; rotor; surface micromachine technology; Electrostatics; Fabrication; Insulation; Insulators; Microactuators; Microstructure; Motion control; Shafts; Shape; Silicon;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/84.260254
Filename
260254
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