DocumentCode :
1020725
Title :
Hexagonal a-Si:H TFTs: A New Advanced Technology for Flat-Panel Displays
Author :
Lee, Hojin ; Yoo, Juhn-Suk ; Kim, Chang-Dong ; Kang, In-Byeong ; Kanicki, Jerzy
Author_Institution :
Michigan Univ., Ann Arbor
Volume :
55
Issue :
1
fYear :
2008
Firstpage :
329
Lastpage :
336
Abstract :
Inverted stagger hexagonal hydrogenated amorphous silicon thin-film transistors (a-Si:H HEX-TFTs) were fabricated with a five-photomask process used in the processing of the active-matrix liquid crystal displays. We show that the output current of a-Si:H HEX-TFTs connected in parallel increases linearly with their number within a given pixel circuit. Current-voltage measurements indicate that a high ON-OFF current ratio and a low subthreshold slope can be maintained for multiple HEX-TFTs connected in parallel, whereas the field-effect mobility and threshold voltage remain identical to a single a-Si:H HEX-TFT. Due to a unique device geometry, an enhanced electrical stability and a larger pixel aperture ratio can be achieved in the multiple a-Si:H HEX-TFT in comparison to a standard single a-Si:H TFT having the same channel width. These HEX-TFT electrical characteristics are very desirable for active-matrix organic light-emitting displays.
Keywords :
amorphous semiconductors; elemental semiconductors; field effect transistors; flat panel displays; light emitting devices; liquid crystal displays; masks; silicon; thin film transistors; ON-OFF current ratio; Si; active-matrix liquid crystal displays; active-matrix organic light-emitting displays; current-voltage measurement; electrical characteristics; enhanced electrical stability; field-effect mobility; flat-panel displays; hexagonal a-Si:H thin-film transistors; inverted stagger hydrogenated amorphous silicon; larger pixel aperture ratio; photomask process; Active matrix liquid crystal displays; Active matrix technology; Amorphous silicon; Apertures; Circuit stability; Current measurement; Geometry; Liquid crystal displays; Thin film transistors; Threshold voltage; Hexagonal thin-film transistor (HEX-TFT); hydrogenate amorphous silicon (a-Si:H); large channel width; multiple transistor; parallel connected;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.911090
Filename :
4408790
Link To Document :
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