Influences of sputtering gas pressure on microtexture and crystallographic characteristics of Ba-ferrite thin films for high density recording media

Author

Morisako, A. ; Matsumoto, M. ; Naoe, M.

Author_Institution

Shinshu University, Nagano, Japan

Volume

23

Issue

1

fYear

1987

fDate

1/1/1987 12:00:00 AM

Firstpage

56

Lastpage

58

Abstract

Ba-ferrite films with small c-axis dispersion angle Δθ50are suitable for ultrahigh density recording media. The dependences of partial oxygen gas pressure PO2and total discharge gas pressure PTotalon the characteristics of Ba-ferrite films were clarified. It was found that there were three regions, where films were composed of single layer of spinel type ferrite(PO2≤0.002mTorr), mixed layer of spinel and magnetoplumbite type ferrites ( $0.003 \\leq P_{O2} \\leq 0.2$ mTorr) and single layer of magnetoplumbite type ferrite (PO2>0.3 mTorr). In the range of P02between 0.005 and 0.2 mTorr, spinel-like ferrite layer plays very important role as an underlayer to decrease the Δθ50of the Ba-ferrite layer. Films deposited at relatively low PO2and PTotalexhibit very smooth surface and Δθ50as small as $2.5\\sim3.5\\deg$ .

Keywords

Perpendicular magnetic recording; Sputtering; Crystallography; Ferrite films; Magnetic films; Magnetization; Perpendicular magnetic recording; Sputtering; Substrates; Surface discharges; Temperature measurement; X-ray diffraction;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.1987.1064821

Filename

1064821