Title :
Oxygen influence on drawing-induced defect centres and radiation-induced loss in pure silica optical fibres
Author :
Hibino, Y. ; Hanafusa, H. ; Yamamoto, Fumihiko
Author_Institution :
NTT Electrical Communications Laboratories, Tokai, Japan
Abstract :
Drawing-induced defect centres are investigated in pure silica optical fibres drawn from the preforms consolidated in O2-including atmospheres. The drawing-induced E¿ centres decrease while the peroxy radicals increase with increasing flow rate of O2 into the consolidation furnance. The ¿-ray-induced loss of these fibres is also examined.
Keywords :
defect electron energy states; drawing (mechanical); gamma-ray effects; optical fibres; optical losses; paramagnetic resonance of defects; silicon compounds; E´ centres; ESR; O2; SiO2 optical fibres; drawing-induced defect centres; peroxy radicals; radiation-induced loss; ¿-ray-induced loss;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19860296
