DocumentCode :
1022315
Title :
Integrated laser/phototransistor optoelectronic switching device by organometallic vapour phase epitaxy
Author :
Schaus, C.F. ; Shealy, J.R. ; Najjar, F.E. ; Eastman, F.L.
Author_Institution :
Cornell University, School of Electrical Engineering, Ithaca, USA
Volume :
22
Issue :
9
fYear :
1986
Firstpage :
454
Lastpage :
456
Abstract :
Computer-controlled organometallic vapour phase epitaxy has been used to optimise AlGaAs/GaAs quantum well lasers and bipolar phototransistors separately. Here the two structures are combined In a single growth to realise a high-performance two-terminal optoelectronic switch. DC I/V characteristics are typical of an npnp structure; however, the feedback mechanism is optical rather than electronic. Threshold switching voltage is determined by the optical input in the range 1.3¿23 V and sensitivity is 2.5 V/¿W. Output is both optical (laser) and electrical current. Gain is provided by the phototransistor and optical feedback and exceeds 104. Switching speed is determined to be less than 1 ns.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; integrated optoelectronics; phototransistors; semiconductor junction lasers; semiconductor switches; vapour phase epitaxial growth; AlGaAS/GaAs quantum well lasers; DC I/ V characteristics; MOVPE; OMVPE; bipolar phototransistors; high-performance two-terminal optoelectronic switch; laser/phototransistor optoelectronic switching device; optical feedback; organometallic vapour phase epitaxy; semiconductors; single growth; switching speed 1 ns; threshold switching voltage sensitivity;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19860309
Filename :
4256503
Link To Document :
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