DocumentCode
1022315
Title
Integrated laser/phototransistor optoelectronic switching device by organometallic vapour phase epitaxy
Author
Schaus, C.F. ; Shealy, J.R. ; Najjar, F.E. ; Eastman, F.L.
Author_Institution
Cornell University, School of Electrical Engineering, Ithaca, USA
Volume
22
Issue
9
fYear
1986
Firstpage
454
Lastpage
456
Abstract
Computer-controlled organometallic vapour phase epitaxy has been used to optimise AlGaAs/GaAs quantum well lasers and bipolar phototransistors separately. Here the two structures are combined In a single growth to realise a high-performance two-terminal optoelectronic switch. DC I/V characteristics are typical of an npnp structure; however, the feedback mechanism is optical rather than electronic. Threshold switching voltage is determined by the optical input in the range 1.3¿23 V and sensitivity is 2.5 V/¿W. Output is both optical (laser) and electrical current. Gain is provided by the phototransistor and optical feedback and exceeds 104. Switching speed is determined to be less than 1 ns.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; integrated optoelectronics; phototransistors; semiconductor junction lasers; semiconductor switches; vapour phase epitaxial growth; AlGaAS/GaAs quantum well lasers; DC I/ V characteristics; MOVPE; OMVPE; bipolar phototransistors; high-performance two-terminal optoelectronic switch; laser/phototransistor optoelectronic switching device; optical feedback; organometallic vapour phase epitaxy; semiconductors; single growth; switching speed 1 ns; threshold switching voltage sensitivity;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19860309
Filename
4256503
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