DocumentCode :
1022429
Title :
Planar VPE infill 1.3 μm integrated laser/monitor photodiode with CARIBE etched facets
Author :
Williams, P.J. ; Webb, A.P. ; Goodridge, I.H. ; Carter, A.C.
Author_Institution :
Plessey Research (Caswell Limited, Allen Clark Research Centre, Towcester, UK
Volume :
22
Issue :
9
fYear :
1986
Firstpage :
472
Lastpage :
473
Abstract :
We report the preparation of a novel, planar VPE infill 1.3 μm laser featuring an integrated monitor photodiode. The rear laser and front photodiode facets were formed by chemically assisted reactive ion beam etching (CARIBE). Threshold currents were as low as 17 mA with efficiencies up to 17% per facet. The laser/monitor photodiode sensitivity was ˜5 μA/mW.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; integrated optoelectronics; photodiodes; semiconductor junction lasers; sputter etching; vapour phase epitaxial growth; CARIBE etched facets; chemically assisted reactive ion beam etching; efficiencies; integrated laser/monitor photodiode; integrated monitor photodiode; planar VPE infill; preparation; sensitivity; threshold currents; wavelength 1.3 micron;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19860321
Filename :
4256515
Link To Document :
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