DocumentCode :
1022836
Title :
Charge-storage effects in silicon dioxide films
Author :
Yamin, M.
Volume :
11
Issue :
11
fYear :
1964
fDate :
11/1/1964 12:00:00 AM
Firstpage :
531
Lastpage :
532
Keywords :
Insulation; Laboratories; Magnetic field measurement; Magnetic fields; Plasma temperature; Plasma waves; Semiconductor films; Silicon compounds; Solid state circuits; Surface discharges;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1964.15391
Filename :
1473779
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1022836
