• DocumentCode
    1023851
  • Title

    High-speed ring oscillators using planar p+-gate n-AlGaAs/GaAs 2DEG FETs

  • Author

    Suzuki, Yuya ; Hida, Hirotaka ; Toyoshima, Hisashi ; Ohata, Katsuki

  • Author_Institution
    NEC Corporation, Microelectronics Research Laboratories, Kawasaki, Japan
  • Volume
    22
  • Issue
    12
  • fYear
    1986
  • Firstpage
    672
  • Lastpage
    674
  • Abstract
    An E/R DCFL ring oscillator has been fabricated using a planar n-AlGaAs/GaAs 2DEG enhancement FET with p+-gate structure. For 1 ¿m gate length E-FETs, the standard deviation of threshold voltage was as small as 17.6 mV at 0.016 V average threshold voltage. At room temperature, a gate propagation delay of 15 ps/gate at a 5.25 mW/gate power dissipation was obtained from a 25-stage ring oscillator. A small minimum power-delay product of 14 fJ/gate was attained at 0.65 V supply voltage.
  • Keywords
    III-V semiconductors; aluminium compounds; field effect integrated circuits; gallium arsenide; high electron mobility transistors; integrated logic circuits; oscillators; 2DEG FETs; 5.25 mW/gate power dissipation; DCFL ring oscillator; HEMT; III-V semiconductors; logic IC; n-AlGaAs/GaAs; p+-gate structure; two-dimensional electron gas device;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19860460
  • Filename
    4256658