Title :
Optical and microwave performance of GaAs-AlGaAs and strained layer InGaAs-GaAs-AlGaAs graded index separate confinement heterostructure single quantum well lasers
Author :
Offsey, S.D. ; Shcaff, W.J. ; Tasker, P.J. ; Eastman, L.F.
Author_Institution :
Dept. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
Abstract :
GaAs-AlGaAs and strained layer In/sub 0.3/Ga/sub 0.7/As-GaAs-AlGaAs GRINSCH SQW lasers grown by molecular beam epitaxy are discussed. The strained-layers have threshold currents of 12 mA for 30- mu m*400- mu m devices (1000 A/cm/sup 2/) and threshold current densities of 167 A/cm/sup 2/ for 150- mu m*800- mu m devices. The threshold currents of strained-layer InGaAs lasers are lower than those of GaAs for all dimensions tested with 20- mu m-wide GaAs devices exhibiting threshold currents three times those of In/sub 0.3/Ga/sub 0.7/As devices. Microwave modulation of 10- mu m*500- mu m strained-layer lasers with simple mesa structures yields bandwidths of 6 GHz. For all dimensions tested, strained-layer InGaAs devices have greater bandwidths than GaAs devices. These measurements confirm theoretical predictions of the effects of valence band modification due to biaxially compressive strain.<>
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; gradient index optics; indium compounds; semiconductor junction lasers; 10 micron; 12 mA; 150 micron; 20 micron; 3 micron; 400 micron; 500 micron; 6 GHz; 800 micron; GRINSCH SQW laser; GaAs-AlGaAs; III-V semiconductor; In/sub 0.3/Ga/sub 0.7/As-GaAs-AlGaAs; bandwidths; biaxially compressive strain; graded index separate confinement heterostructure single quantum well lasers; microwave modulation; microwave performance; molecular beam epitaxy; optical performance; simple mesa structures; strained layer InGaAs-GaAs-AlGaAs; threshold currents; valence band modification; Bandwidth; Gallium arsenide; Indium gallium arsenide; Laser theory; Masers; Microwave devices; Molecular beam epitaxial growth; Strain measurement; Testing; Threshold current;
Journal_Title :
Photonics Technology Letters, IEEE