DocumentCode :
1024106
Title :
Superconducting beryllium films deposited by ion-beam-sputtering
Author :
Maeda, Y. ; Takei, K. ; Okamoto, M. ; Nakamura, K. ; Igarashi, M.
Author_Institution :
NTT Electrical Communications Laboratories, Ibaraki, Japan
Volume :
23
Issue :
2
fYear :
1987
fDate :
3/1/1987 12:00:00 AM
Firstpage :
1022
Lastpage :
1025
Abstract :
The properties of beryllium thin films deposited by ion-beam-sputtering (IBS-Be) are investigated, IBS-Be films with high superconducting transition temperatures (Tc´S = 6-7 K) have an amorphous-like structure. Tc´s show thermal stabitlity up to 480 K. IBS-Be/BeO/Pb junctions with low leakage conductance indicate IBS-Be base electrodes do not deteriorate and that the Be-oxidized layers function as good tunnel barriers, The deduced value of the electron density of states at the Fermi level remains as low as that for bulk beryllium. IBS-Be films are considered to be advantageous for applications to tunneling and Abrikosov vortex devices.
Keywords :
Beryllium materials/devices; Superconducting films; Amorphous materials; Argon; Crystallization; Diffraction; Electrons; Ion beams; Substrates; Superconducting films; Superconducting transition temperature; Tunneling;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1987.1065006
Filename :
1065006
Link To Document :
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