DocumentCode :
1024166
Title :
Microstructure, resistivity and the anisotropy of the upper critical field in NbN thin films
Author :
Rudman, D.A. ; Juang, J.Y. ; van Dover, R.B. ; Nakahara, S. ; Capone, D.W., II ; Talvacchio, J.
Author_Institution :
Massachusetts Institute of Technology, Cambridge, MA
Volume :
23
Issue :
2
fYear :
1987
fDate :
3/1/1987 12:00:00 AM
Firstpage :
831
Lastpage :
838
Abstract :
The upper critical field of most polycrystalline NbN thin films is anisotropic. with the perpendicular critical field Hc2( \\perp ) larger than the parallel critical field-Hc2(∥). We have measured the angular dependence Hc2(Θ) for samples with both a columnar and non-columnar microstructure. In both cases we find a rounded maximum near Hc2( \\perp ). The shape of Hc2(Θ), combined with the known microstructure of the films and the linear temperature dependence of Hc2for both field orientations leads us to conclude that the mechanism responsible for this anisotropy is an anisotropic conductivity in the film, probably due to differences in the grain boundary resistance in the plane of the film and normal to the film. In contrast, a single crystal film shows only surface superconductivity.
Keywords :
Superconducting films; Anisotropic conductive films; Anisotropic magnetoresistance; Conductivity; Grain boundaries; Microstructure; Shape; Superconducting films; Surface resistance; Temperature dependence; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1987.1065011
Filename :
1065011
Link To Document :
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