DocumentCode :
1024581
Title :
Josephson junctions with silicon interlayer and arrays
Author :
Amatuni, L.E. ; Gubankov, V.N. ; Kovtonyuk, S. ; Koshelets, P. ; Ovsyannikov, G.A. ; Serpuchenko, L. ; Vystavkin, A.N.
Author_Institution :
Institute of Radio Engineering and Electronics, Moscow, USSR
Volume :
23
Issue :
2
fYear :
1987
fDate :
3/1/1987 12:00:00 AM
Firstpage :
680
Lastpage :
683
Abstract :
Dc and microwave properties of the Josephson sandwiches with amorphous silicon interlayer based on refractory materials have been investigated in a wide temperature range. The junctions have nonhysteresis I-V curves down to temperatures 2.2K. Reduced normal state resistance value can be varied in the range RNS = (5-5000) Ω μm2by changing the Si interlayer thickness; the ICRNproducts Vo= (0.3-1) mV at the same time. Experimental data can be explained by resonance mechanism of electrical charge transferring through silicon interlayer. The transfer takes place along impurity resonant trajectories caused by the presence of the localized states in the forbidden band of the amorphous silicon. The mutual locking in the arrays has been investigated providing that there is a loop for ac Josephson currents. Due to a high Vovalue the mutual locking in the two junctions cell has been observed up to the voltage 1 mV which corresponds to submillimeter wavelength.
Keywords :
Amorphous semiconductor materials/devices; Josephson devices; Silicon materials/devices; Amorphous materials; Amorphous silicon; Counting circuits; Electrodes; Josephson junctions; Niobium; Radio frequency; Resonance; Sputter etching; Temperature;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1987.1065047
Filename :
1065047
Link To Document :
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