DocumentCode
1024752
Title
New fabrication technique for integrated-optical taper with controllable profile by selective liquid-phase epitaxy of GaAs
Author
Sang Bae Kim ; Kee Young Kwon ; Young Se Kwon
Author_Institution
Korea Advanced Institute of Science & Technology, Department of Electrical Engineering, Seoul, Korea
Volume
22
Issue
15
fYear
1986
Firstpage
806
Lastpage
808
Abstract
A new fabrication technique for integrated-optical tapers with controllable profiles on a GaAs substrate by selective liquid-phase epitaxy is proposed based on two-dimensional numerical results, and preliminary experimental results are given. This technique takes advantage of the dependence of the epitaxial layer thickness on the window width.
Keywords
III-V semiconductors; gallium arsenide; integrated optics; liquid phase epitaxial growth; controllable profile; epitaxial layer thickness; experimental results; fabrication technique; integrated optics; integrated-optical taper; selective LPE; selective liquid-phase epitaxy; semiconductors; two-dimensional numerical results; window width;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19860553
Filename
4256757
Link To Document